Integrated assemblies, and methods of forming integrated assemblies

ABSTRACT

Some embodiments include an integrated assembly having a memory array region, a staircase region, and an intervening region between the staircase region and the memory array region. The intervening region includes first and second slabs of insulative material extending through a stack of alternating insulative and conductive levels. Bridging regions are adjacent to the slabs. First slits are along the bridging regions, and second slits extend through the slabs. First panels are within the first slits, and second panels are within the second slits. The second panels are compositionally different from the first panels. Some embodiments include methods of forming integrated assemblies.

RELATED PATENT DATA

This patent resulted from a divisional of U.S. patent application Ser.No. 16/784,435 filed Feb. 7, 2020, which is hereby incorporated byreference herein.

TECHNICAL FIELD

Integrated assemblies (e.g., integrated memory), and methods of formingintegrated assemblies.

BACKGROUND

Memory provides data storage for electronic systems. Flash memory is onetype of memory, and has numerous uses in modern computers and devices.For instance, modern personal computers may have BIOS stored on a flashmemory chip. As another example, it is becoming increasingly common forcomputers and other devices to utilize flash memory in solid statedrives to replace conventional hard drives. As yet another example,flash memory is popular in wireless electronic devices because itenables manufacturers to support new communication protocols as theybecome standardized, and to provide the ability to remotely upgrade thedevices for enhanced features.

NAND may be a basic architecture of flash memory, and may be configuredto comprise vertically-stacked memory cells (memory structures).

Before describing NAND specifically, it may be helpful to more generallydescribe the relationship of a memory array within an integratedarrangement. FIG. 1 shows a block diagram of a prior art device 1000which includes a memory array 1002 having a plurality of memory cells1003 arranged in rows and columns along with access lines 1004 (e.g.,wordlines to conduct signals WLO through WLm) and first data lines 1006(e.g., bitlines to conduct signals BLO through BLn). Access lines 1004and first data lines 1006 may be used to transfer information to andfrom the memory cells 1003. A row decoder 1007 and a column decoder 1008decode address signals AO through AX on address lines 1009 to determinewhich ones of the memory cells 1003 are to be accessed. A senseamplifier circuit 1015 operates to determine the values of informationread from the memory cells 1003. An I/O circuit 1017 transfers values ofinformation between the memory array 1002 and input/output (I/O) lines1005. Signals DQ0 through DQN on the I/O lines 1005 can represent valuesof information read from or to be written into the memory cells 1003.Other devices can communicate with the device 1000 through the I/O lines1005, the address lines 1009, or the control lines 1020. A memorycontrol unit 1018 is used to control memory operations to be performedon the memory cells 1003, and utilizes signals on the control lines1020. The device 1000 can receive supply voltage signals Vcc and Vss ona first supply line 1030 and a second supply line 1032, respectively.The device 1000 includes a select circuit 1040 and an input/output (I/O)circuit 1017. The select circuit 1040 can respond, via the I/O circuit1017, to signals CSEL1 through CSELn to select signals on the first datalines 1006 and the second data lines 1013 that can represent the valuesof information to be read from or to be programmed into the memory cells1003. The column decoder 1008 can selectively activate the CSEL1 throughCSELn signals based on the A0 through AX address signals on the addresslines 1009. The select circuit 1040 can select the signals on the firstdata lines 1006 and the second data lines 1013 to provide communicationbetween the memory array 1002 and the I/O circuit 1017 during read andprogramming operations.

The memory array 1002 of FIG. 1 may be a NAND memory array, and FIG. 2shows a schematic diagram of a three-dimensional NAND memory device 200which may be utilized for the memory array 1002 of FIG. 1 . The device200 comprises a plurality of strings of charge-storage devices. In afirst direction (Z-Z′), each string of charge-storage devices maycomprise, for example, thirty-two charge-storage devices stacked overone another with each charge-storage device corresponding to one of, forexample, thirty-two tiers (e.g., Tier0-Tier31). The charge-storagedevices of a respective string may share a common channel region, suchas one formed in a respective pillar of semiconductor material (e.g.,polysilicon) about which the string of charge-storage devices is formed.In a second direction (X-X′), each first group of, for example, sixteenfirst groups of the plurality of strings may comprise, for example,eight strings sharing a plurality (e.g., thirty-two) of access lines(i.e., “global control gate (CG) lines”, also known as wordlines, WLs).Each of the access lines may couple the charge-storage devices within atier. The charge-storage devices coupled by the same access line (andthus corresponding to the same tier) may be logically grouped into, forexample, two pages, such as P0/P32, P1/P33, P2/P34 and so on, when eachcharge-storage device comprises a cell capable of storing two bits ofinformation. In a third direction (Y-Y′), each second group of, forexample, eight second groups of the plurality of strings, may comprisesixteen strings coupled by a corresponding one of eight data lines. Thesize of a memory block may comprise 1,024 pages and total about 16 MB(e.g., 16 WLs×32 tiers×2 bits=1,024 pages/block, block size=1,024pages×16 KB/page=16 MB). The number of the strings, tiers, access lines,data lines, first groups, second groups and/or pages may be greater orsmaller than those shown in FIG. 2 .

FIG. 3 shows a cross-sectional view of a memory block 300 of the 3D NANDmemory device 200 of FIG. 2 in an X-X′ direction, including fifteenstrings of charge-storage devices in one of the sixteen first groups ofstrings described with respect to FIG. 2 . The plurality of strings ofthe memory block 300 may be grouped into a plurality of subsets 310,320, 330 (e.g., tile columns), such as tile column_(I), tile column_(j)and tile column_(K), with each subset (e.g., tile column) comprising a“partial block” (sub-block) of the memory block 300. A global drain-sideselect gate (SGD) line 340 may be coupled to the SGDs of the pluralityof strings. For example, the global SGD line 340 may be coupled to aplurality (e.g., three) of sub-SGD lines 342, 344, 346 with each sub-SGDline corresponding to a respective subset (e.g., tile column), via acorresponding one of a plurality (e.g., three) of sub-SGD drivers 332,334, 336. Each of the sub-SGD drivers 332, 334, 336 may concurrentlycouple or cut off the SGDs of the strings of a corresponding partialblock (e.g., tile column) independently of those of other partialblocks. A global source-side select gate (SGS) line 360 may be coupledto the SGSs of the plurality of strings. For example, the global SGSline 360 may be coupled to a plurality of sub-SGS lines 362, 364, 366with each sub-SGS line corresponding to the respective subset (e.g.,tile column), via a corresponding one of a plurality of sub-SGS drivers322, 324, 326. Each of the sub-SGS drivers 322, 324, 326 mayconcurrently couple or cut off the SGSs of the strings of acorresponding partial block (e.g., tile column) independently of thoseof other partial blocks. A global access line (e.g., a global CG line)350 may couple the charge-storage devices corresponding to therespective tier of each of the plurality of strings. Each global CG line(e.g., the global CG line 350) may be coupled to a plurality ofsub-access lines (e.g., sub-CG lines) 352, 354, 356 via a correspondingone of a plurality of sub-string drivers 312, 314 and 316. Each of thesub-string drivers may concurrently couple or cut off the charge-storagedevices corresponding to the respective partial block and/or tierindependently of those of other partial blocks and/or other tiers. Thecharge-storage devices corresponding to the respective subset (e.g.,partial block) and the respective tier may comprise a “partial tier”(e.g., a single “tile”) of charge-storage devices. The stringscorresponding to the respective subset (e.g., partial block) may becoupled to a corresponding one of sub-sources 372, 374 and 376 (e.g.,“tile source”) with each sub-source being coupled to a respective powersource.

The NAND memory device 200 is alternatively described with reference toa schematic illustration of FIG. 4 .

The memory array 200 includes wordlines 202 ₁ to 202 _(N), and bitlines228 ₁ to 228 _(M).

The memory array 200 also includes NAND strings 206 ₁ to 206 _(M). EachNAND string includes charge-storage transistors 208 ₁ to 208 _(N). Thecharge-storage transistors may use floating gate material (e.g.,polysilicon) to store charge, or may use charge-trapping material (suchas, for example, silicon nitride, metallic nanodots, etc.) to storecharge.

The charge-storage transistors 208 are located at intersections ofwordlines 202 and strings 206. The charge-storage transistors 208represent non-volatile memory cells for storage of data. Thecharge-storage transistors 208 of each NAND string 206 are connected inseries source-to-drain between a source-select device (e.g., source-sideselect gate, SGS) 210 and a drain-select device (e.g., drain-side selectgate, SGD) 212. Each source-select device 210 is located at anintersection of a string 206 and a source-select line 214, while eachdrain-select device 212 is located at an intersection of a string 206and a drain-select line 215. The select devices 210 and 212 may be anysuitable access devices, and are generically illustrated with boxes inFIG. 4 .

A source of each source-select device 210 is connected to a commonsource line 216. The drain of each source-select device 210 is connectedto the source of the first charge-storage transistor 208 of thecorresponding NAND string 206. For example, the drain of source-selectdevice 210 ₁ is connected to the source of charge-storage transistor 208₁ of the corresponding NAND string 206 ₁. The source-select devices 210are connected to source-select line 214.

The drain of each drain-select device 212 is connected to a bitline(i.e., digit line) 228 at a drain contact. For example, the drain ofdrain-select device 212 ₁ is connected to the bitline 228 ₁. The sourceof each drain-select device 212 is connected to the drain of the lastcharge-storage transistor 208 of the corresponding NAND string 206. Forexample, the source of drain-select device 212 ₁ is connected to thedrain of charge-storage transistor 208 _(N) of the corresponding NANDstring 206 ₁.

The charge-storage transistors 208 include a source 230, a drain 232, acharge-storage region 234, and a control gate 236. The charge-storagetransistors 208 have their control gates 236 coupled to a wordline 202.A column of the charge-storage transistors 208 are those transistorswithin a NAND string 206 coupled to a given bitline 228. A row of thecharge-storage transistors 208 are those transistors commonly coupled toa given wordline 202.

The memory arrays (memory devices) described above may be fabricated onsemiconductor dies. FIGS. 5-8 illustrate regions of an exampleintegrated assembly 600 associated with a conventional die comprisingconventional memory devices. The top-down view of FIG. 5 shows that theintegrated assembly 600 includes a staircase region (or stadium region)602 between a pair of memory array regions 604 and 606 (also referred toas Array-1 and Array-2). Gaps are provided between the staircase region602 and the memory array regions 604 and 606 to indicate that there maybe additional components between the staircase region and the memoryarray regions.

Although the illustrated application has a single staircase region 602shown to be laterally between the memory array regions 604 and 606, inother applications two or more staircase regions may be laterallyoutward of the memory array regions.

The memory array regions and staircase region are subdivided amongstmemory device sub-blocks (also referred to herein as blocks, or as blockregions) 608 and 610. The illustrated block regions 608 and 610 areshown to extend across both of the memory arrays and the interveningstaircase region. In other applications, the memory arrays may beconsidered to comprise different block regions relative to one another.

Peripheral regions 612, 614 and 616 are along edges of the block regions608 and 610. The peripheral region 612 is between the block regions 608and 610; the peripheral region 614 is on an opposing side of the blockregion 608 from the peripheral region 612; and the peripheral region 616is on an opposing side of the block region 610 from the peripheralregion 612. The regions 612, 614 and 616 may be considered to compriseslits filled with insulative material 618.

Channel material pillars 620 (only some of which are labeled) are withinthe memory array regions 604 and 606, and pass through a stack ofconductive levels (discussed below). The channel material pillars 620are shown to be circular, but may comprise any suitable shapes.

FIG. 6 shows a cross-sectional side view within a region “6” of FIG. 5 .The illustrated region includes a stack 622 of alternating conductivelevels 624 and insulative levels 626.

The conductive levels 624 comprise conductive material 628, and theinsulative levels 626 comprise insulative material 630.

The conductive material 628 may comprise any suitable composition(s);and in some embodiments may comprise metal-containing material (e.g.tungsten). In some applications, the conductive material 628 maycomprise a tungsten core at least partially surrounded by a linercomprising metal nitride (e.g., titanium nitride). In some embodiments,dielectric-barrier material (e.g., aluminum oxide) may at leastpartially surround the metal nitride liners within the illustratedlevels 624. Accordingly, some of the material within the levels 624 maybe insulative in some embodiments.

The insulative material 630 may comprise any suitable composition(s);and in some applications may comprise, consist essentially of, orconsist of silicon dioxide.

The channel material pillars 620 extend through the stack 622, andcomprise channel material 632. The channel material 632 may, forexample, comprise, consist essentially of, or consist ofappropriately-doped silicon. The channel material pillars 620 are shownto be annular rings surrounding insulative material 634. Suchconfiguration of the channel material pillars may be considered tocorrespond to a “hollow” channel configuration, with the dielectricmaterial 634 being provided within the hollows of the channel materialpillars. In other applications, the channel material may be configuredas solid pillars, rather than being configured as the illustrated hollowpillars.

The channel material pillars 620 are spaced from the conductive levels624 of the stack 622 by intervening regions 636. The regions 636 maycomprise tunneling material, charge-storage material, charge-blockingmaterial and dielectric-barrier material. The tunneling material (alsoreferred to as gate dielectric material) may comprise one or more ofsilicon dioxide, aluminum oxide, hafnium oxide, zirconium oxide, etc.The charge-storage material may comprise charge-trapping material (e.g.,one or more of silicon nitride, silicon oxynitride, conductive nanodots,etc.). The charge-blocking material may comprise one or more of silicondioxide, silicon oxynitride, aluminum oxide, hafnium oxide, zirconiumoxide, etc. The dielectric-barrier material may comprise one or more ofaluminum oxide, hafnium oxide, zirconium oxide, etc.

Memory cells (e.g., NAND memory cells) 638 (only some of which arelabeled) are along the channel material pillars 620. The memory cells638 include regions of the conductive levels 624 (specifically, controlgate regions), portions of the channel material 632, and portions of thetunneling material, charge-storage material, charge-blocking materialand dielectric-barrier material within the intervening regions 636. Thememory cells 638 are vertically stacked one atop another. In someembodiments, the assembly 600 may be considered to comprise athree-dimensional NAND configuration (three-dimensional memory device)analogous to the configuration described above with reference to FIG. 2.

The conductive levels 624 may be referred to as wordline/control gatelevels, in that they include wordlines and control gates associated withthe vertically-stacked memory cells 638 of NAND strings. The number ofmemory cell levels in individual strings may be determined by the numberof conductive levels 624. The NAND strings may comprise any suitablenumber of memory cell levels. For instance, the NAND strings may have 8memory cell levels, 16 memory cell levels, 32 memory cell levels, 64memory cell levels, 512 memory cell levels, 1024 memory cell levels,etc.

One or more of the lower conductive levels 624 may be incorporated intosource-side select gates (SGSs).

The stack 622 is shown to be supported over a source structure 640. Suchsource structure may be analogous to the source structures 216 discussedabove.

The source structure 640 may be supported by a semiconductor base (notshown). The base may comprise semiconductor material; and may, forexample, comprise, consist essentially of, or consist of monocrystallinesilicon. The base may be referred to as a semiconductor substrate. Theterm “semiconductor substrate” means any construction comprisingsemiconductive material, including, but not limited to, bulksemiconductive materials such as a semiconductive wafer (either alone orin assemblies comprising other materials), and semiconductive materiallayers (either alone or in assemblies comprising other materials). Theterm “substrate” refers to any supporting structure, including, but notlimited to, the semiconductor substrates described above. In someapplications, the base may correspond to a semiconductor substratecontaining one or more materials associated with integrated circuitfabrication. Such materials may include, for example, one or more ofrefractory metal materials, barrier materials, diffusion materials,insulator materials, etc.

FIG. 7 shows details about a region “7” within the staircase region 602of FIG. 5 . The illustrated region of FIG. 7 includes the peripheralregions 612, 614 and 616 extending along the blocks 608 and 610. Thestack 622 of FIG. 6 passes through the illustrated region of FIG. 7 .However, oxide 642 is provided to breakup such stack. The oxide 642 maybe considered to be configured as slabs 643 which extend through thestack 622 (FIG. 6 ).

Connection regions 646 are between the slabs of oxide 642. Theconnection regions may be utilized for forming electrical connections tothe conductive levels 624 (FIG. 6 ). Each of the conductive levels maybe referred to as a tier. The illustrated connection regions 646 may beutilized to form connections to sets of the tiers. For instance, in theillustrated application one of the connection regions is utilized forforming connections to tiers 1-9, another is utilized for formingconnections to tiers 10-18, another is utilized for forming connectionsto tiers 19-27, etc. The number of tiers accessed within each of theconnection regions 646 may be determined by the overall number ofconductive levels 624 (FIG. 6 ) and the overall number of connectionregions 646.

A portion of the construction of FIG. 7 between a first of theinterconnect regions 646 (the illustrated interconnect region comprisingTiers 1-9) and the memory array (Array-1) may be referred to as anintervening region (crest region) 645.

One problem with the densely-stacked conductive levels 624 of the stack622 (FIG. 6 ) is that such conductive levels may create stresses acrossan underlying semiconductor substrate (wafer, die, etc.). The oxide 642within the crest region 645 may replace large portions of the stack 622to alleviate such stresses.

The peripheral regions 612, 614 and 616 are labeled as “Bridge Regions”to indicate that the regions 612, 614 and 616 may provide paths for theconductive levels of stack 622 (FIG. 6 ) to extend around the oxideslabs 643 and thereby reach the connection regions 646.

FIG. 8 shows a cross-sectional side view along the line 8-8 of FIG. 7 .The conductive levels 624 are shown to have staggered terminal regions648 within the interconnect connection regions 626, with such staggeredterminal regions having a “staircase” configuration. The staggeredterminal regions of the conductive levels 624 enable connections to bemade from such conductive levels to appropriate circuitry (e.g.,wordline driver circuitry). The view of FIG. 8 shows three of theconductive levels 624 being accessed in each of the interconnect regions626. Such is for illustrative purposes only. Any suitable number of theconductive levels 624 may be accessed in the interconnect regions 626.

The bridge regions of FIG. 7 may be considered to be within slitsprovided along edges of the blocks 608 and 610. Additional slits may beprovided within central regions of such blocks. In some applications,the conductive levels 624 may be formed utilizing gate-replacementmethodology. Specifically, the levels 624 of FIGS. 6 and 8 may initiallycomprise sacrificial material, and then such sacrificial material may beremoved and replaced with the conductive material 628. The levels 624may be accessed with the slits formed in the regions 612, 614 and 616;and with any additional slits provided within central regions of theillustrated blocks 608 and 610. A problem with conventional processingmay be that stresses may be induced during the forming of such slits,the utilization of such slits during the removal of sacrificial materialfrom levels 624 and replacement of such sacrificial material withconductive material, and/or during the subsequent filling of the slitswith material 618. Such stresses which may undesirably cause the blocksto bend. The bending of the blocks may lead to structural defects, andmay ultimately lead to device failure.

It would be desirable to develop methods which alleviate the undesirablestresses induced during conventional processing, and to develop newarchitectures fabricated with such methods.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a block diagram of a prior art memory device having amemory array with memory cells.

FIG. 2 shows a schematic diagram of the prior art memory device of FIG.1 in the form of a 3D NAND memory device.

FIG. 3 shows a cross-sectional view of the prior art 3D NAND memorydevice of FIG. 2 in an X-X′ direction.

FIG. 4 is a schematic diagram of a prior art NAND memory array.

FIG. 5 is a diagrammatic top-down view of a prior art integratedassembly showing a staircase region laterally between memory arrayregions associated with a semiconductor die.

FIG. 6 is a diagrammatic cross-sectional side view along a region “6” ofthe prior art integrated assembly of FIG. 5 .

FIG. 7 is a diagrammatic top-down view along a region “7” of the priorart integrated assembly of FIG. 5 .

FIG. 8 is a diagrammatic cross-sectional side view along a line 8-8 ofthe prior art integrated assembly of FIG. 7 .

FIGS. 9, 9A and 9B are views of an assembly at an example process stageof an example method. The view of FIG. 9 is a diagrammatic top-downview. The view of FIG. 9A is a diagrammatic cross-sectional side viewalong the line A-A of FIG. 9 . The view of FIG. 9B is a diagrammaticcross-sectional side view along a cross-section analogous to that ofprior art FIG. 8 .

FIGS. 10 and 10A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 9, 9A and 9B. The view ofFIG. 10 is a diagrammatic top-down view. The view of FIG. 10A is adiagrammatic cross-sectional side view along the line A-A of FIG. 10 .

FIGS. 11 and 11A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 10 and 10A. The view ofFIG. 11 is a diagrammatic top-down view. The view of FIG. 11A is adiagrammatic cross-sectional side view along the line A-A of FIG. 11 .

FIGS. 12 and 12A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 11 and 11A. The view ofFIG. 12 is a diagrammatic top-down view. The view of FIG. 12A is adiagrammatic cross-sectional side view along the line A-A of FIG. 12 .

FIGS. 13 and 13A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 12 and 12A. The view ofFIG. 13 is a diagrammatic top-down view. The view of FIG. 13A is adiagrammatic cross-sectional side view along the line A-A of FIG. 13 .

FIG. 13B is a top-down view similar to that of FIG. 13 .

FIGS. 14 and 14A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 13 and 13A. The view ofFIG. 14 is a diagrammatic top-down view. The view of FIG. 14A is adiagrammatic cross-sectional side view along the line A-A of FIG. 14 .

FIGS. 15 and 15A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 14 and 14A. The view ofFIG. 15 is a diagrammatic top-down view. The view of FIG. 15A is adiagrammatic cross-sectional side view along the line A-A of FIG. 15 .

FIGS. 16, 16A and 16B are views of the assembly of FIGS. 9, 9A and 9B atan example process stage following that of FIGS. 15 and 15A. The view ofFIG. 16 is a diagrammatic top-down view. The view of FIG. 16A is adiagrammatic cross-sectional side view along the line A-A of FIG. 16 .The view of FIG. 16B is a diagrammatic cross-sectional side view along across-section analogous to that of prior art FIG. 8 .

FIGS. 17 and 17A are views of the assembly of FIGS. 9, 9A and 9B at anexample process stage following that of FIGS. 16, 16A and 16B. The viewof FIG. 17 is a diagrammatic top-down view. The view of FIG. 17A is adiagrammatic cross-sectional side view along the line A-A of FIG. 17 .

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Some embodiments include recognition that the die-bending problemsdescribed above in the Background section may result, at least in part,from stresses imposed during the filling of slits within the interveningregions (crest regions) described above (i.e., the intervening regions645 between the memory array regions and the staircase regions). Someembodiments form and fill a first series of the slits while maintainingsymmetry across the intervening regions, and subsequently form and filla second series of the slits. Example embodiments are described withreference to FIGS. 9-17 .

Referring to FIGS. 9 and 9A, an integrated assembly (construction,architecture, etc.) 10 includes a stack 12 supported over a sourcestructure 14. The assembly 10 of FIGS. 9 and 9A may be within the region602 described above with reference to FIG. 5 ; and specifically maycorrespond to an intervening (crest) region 15 analogous to the region645 described above with reference to FIG. 7 .

The source structure 14 may be analogous to the source structure 640described above with reference to FIG. 6 .

The stack 12 includes alternating first and second levels (tiers) 24 and26. The first levels 24 comprise sacrificial material 16, and the secondlevels 26 comprise insulative material 18.

The sacrificial material 16 may comprise any suitable composition(s);and in some embodiments may comprise, consist essentially of, or consistof silicon nitride.

The insulative material 18 may comprise any suitable composition(s); andin some embodiments may comprise, consist essentially of, or consist ofsilicon dioxide. The insulative material 18 may be referred to as afirst insulative material to distinguish it from other insulativematerials.

Insulative material 28 extends into the stack 12. The insulativematerial 28 is configured as a pair of slabs 20 and 22; which may bereferred to as a first insulative slab and a second insulative slab,respectively.

The insulative material 28 may be referred to as a second insulativematerial to distinguish it from the first insulative material 18. Theinsulative material 28 may comprise any suitable composition(s); and insome embodiment may comprise, consist essentially of, or consist ofsilicon dioxide.

The slabs 20 and 22 may be analogous to the slabs 643 described abovewith reference to FIG. 7 .

A first bridging region 30 is between the slabs 20 and 22; a secondbridging region 32 is on an opposing sides of the first slab 20 from thefirst bridging region 30; and a third bridging region 34 is on anopposing side of the second slab 22 from the first bridging region 30.The first, second and third bridging regions may be considered tocomprise first, second and third portions of the stack 12.

The bridging regions 30, 32 and 34 may be considered to be withinperipheral regions analogous to the regions 612, 614 and 616 describedabove with reference to FIG. 7 .

The region 15 of FIGS. 9 and 9A may be adjacent a memory array of thetype described above with reference to FIGS. 5, 6 and 7 . Such a memoryarray may comprise the stack 12 of FIG. 9A. In other words, the stack622 of FIG. 6 may, at the process stage of FIGS. 9 and 9A, comprise thealternating levels 24 and 26, where the sacrificial material 16 isutilized in place of the conductive material 628, and where theinsulative material 18 may be the same as the insulative material 630.

The region 15 of FIGS. 9 and 9A may also be proximate interconnectregions analogous to the regions 646 of FIGS. 7 and 8 . For instance,FIG. 9B shows a region of the assembly 10 which may be proximate theregion 15 of FIGS. 9 and 9A, and which is analogous to the regiondescribed above with reference to FIG. 8 . The region of FIG. 9Bcomprises interconnect regions (staircase regions) 36 analogous to theregions 646 of FIG. 8 . The alternating levels 24 and 26 are within theinterconnect regions 36; with such levels comprising the sacrificialmaterial 16 and the insulative material 18, respectively. The staircaseregions 36 comprises staggered terminal ends 38 of the first levels 16.

The configuration of FIGS. 9 and 9A may be considered to comprise a pairblock regions (blocks, sub-blocks) 40 and 42 analogous to the blockregions 608 and 610 described above with reference to FIG. 5 .

Referring to FIGS. 10 and 10A, a first slit 44 is formed within thefirst bridging portion 30 of the stack 12, a second slit 46 is formedwithin the second bridging portion 32 of the stack 12, and a third slit48 is formed within the third bridging portion 30 of the stack 12. Also,openings 50 are formed to extend through the slabs 20 and 22. Theopenings 50 may be referred to as first openings to distinguish themfrom other openings formed at subsequent process stages. The openings 50are shown to be square along the top-down view of FIG. 10 . In otherembodiments the openings may have other suitable shapes.

The slits 44, 46 and 48 have first widths W₁ along the cross-section ofFIG. 10A, and the openings 50 have second widths W₂ along suchcross-section, with the second widths being larger than the firstwidths. In some applications it may be advantageous for the slits to benarrower than the openings so that less conductive material is formedwithin the slits at a subsequent process stage. Generally, the firstwidths W₁ may be within a range of from about 10% to about 100% of thesecond widths W₂.

A problem which may be associated with conventional (prior art)methodology is that there can be asymmetric processing relative to theblock regions 40 and 42, which can cause stresses along such regionsleading to problematic block-bending. Notably, the process stage ofFIGS. 10 and 10A has symmetry across the regions 40 and 42; andspecifically has mirror symmetry of the indicated regions 30, 32, 34, 40and 42 across the middle of the slit 44.

Referring to FIGS. 11 and 11A, the openings 50 and the slits 44, 48 and46 are lined with liner material 52. The liner material 52 may compriseany suitable composition(s). In some embodiments the liner material 52may be electrically insulative and may comprise, consist essentially of,or consist of one or more of silicon dioxide, high-k dielectricmaterial, carbon, etc.; with the term “high-k” meaning a dielectricconstant greater than that of silicon dioxide (i.e., greater than about3.9). The liner material 52 may include semiconductive compositionsand/or electrically conductive compositions in some embodiments. If theliner material comprises an electrically conductive composition, suchmay be present in a laminate so that outer edges of the liners withinthe slits and openings comprise insulative material while inner portionsof the liners comprise the conductive composition. Suitable conductivecompositions may include, for example, metal nitride, metal carbide,metal silicide, etc.

A material 54 is formed within the lined slits (44, 46 and 48) and thelined openings 50. The material 54 may be insulative, semiconductive orconductive. In some embodiments, the material 54 may be ametal-containing conductive material; and may, for example, comprise,consist essentially of, or consist of tungsten.

The materials 52 and 54 together form support structures (pillars) 56within the openings 50. Some of the support structures may also beutilized as electrical interconnects. Others of the support structuresmay be “dummy” structures in that they comprise conductive material 54but are not utilized as electrical interconnects.

Although the material 54 is shown formed within the slits 44, 46 and 48,in other embodiments the material 52 may entirely fill such slits sothat material 54 is not formed within the slits.

Notably, the blocks 40 and 42 remain symmetric at the processing stageof FIGS. 11 and 11A.

Referring to FIGS. 12 and 12A, a protective mask 58 is formed across theblock regions 40 and 42, and then the material 54 is removed from withinthe slits 44, 46 and 48. The mask 58 comprises masking material 60. Suchmasking material may comprise any suitable composition(s); and in someembodiments may comprise photolithographically-patterned photoresist.

The slits 44, 46 and 48 remain lined with the liner material 42 at theprocessing stage of FIGS. 12 and 12A, and may be considered to benarrowed slits. The openings within such narrowed slits may be referredto as trenches 62.

Notably, the blocks 40 and 42 are symmetric at the processing stage ofFIGS. 12 and 12A.

Referring to FIGS. 13 and 13A, insulative material 64 is formed withinthe trenches 62. The insulative material 64 may comprise any suitablecomposition(s); and in some embodiments may comprise, consistessentially of, or consist of one or more of silicon, silicon dioxide,carbon, high-k material (e.g., aluminum oxide), etc. The insulativematerial 64 may comprise doped silicon dioxide in some embodiments; withexample doped silicon dioxides including borophosphosilicate glass,phosphosilicate glass, fluorosilicate glass, carbon-doped silicondioxide, boron-doped silicon dioxide, etc.

In some embodiments, the insulative material 64 may be referred to as asecond insulative material to distinguish it from the first insulativematerial 18 within the levels 26. In some embodiments, the insulativematerial 64 may be referred to as a third insulative material todistinguish it from the first and second insulative materials 18 and 52.

The materials 52 and 64 together form panels 66 within the slits 44, 46and 48. The panels 66 may be referred to as first panels to distinguishthem from other panels formed at subsequent process stages.

Notably, the blocks 40 and 42 remain symmetric at the process stage ofFIGS. 13 and 13A.

In some embodiments, the materials 52 and 64 may comprise a samecomposition as one another. FIG. 13B shows a configuration analogous tothat of FIG. 13 , but in which the materials 52 and 64 are the samecomposition as one another and merge to form a single compositionlabeled as 52/64. The configuration of FIG. 13B will be utilized for theremaining drawings of this disclosure to simplify the drawings.

Referring to FIGS. 14 and 14A, openings 68 are formed to extend throughthe panels 66. The openings 68 may be referred to as second openings todistinguish them from the first openings 50 shown in FIGS. 10 and 10A.Also, slits 70 and 72 are formed to extend through the slabs 20 and 22,respectively. The openings 68 and slits 70, 72 may be formed with anysuitable processing. For instance, a patterned mask may be provided overthe assembly 10 and utilized to define locations of the openings 68 andthe slits 70, 72; one or more etches may be utilized to form theopenings and slits, and then the patterned mask may be removed to leavethe illustrated assembly.

The slits 70 and 72 may be referred to as a fourth slit and a fifthslit, respectively, in some embodiments.

The openings 68 expose the sacrificial material 16 along the firstlevels 24 of the stack 12. The top-down view of FIG. 14 shows thatremaining regions 74 of the first panels 66 remain between the openings68, with such remaining regions being shown to comprise the material52/64 described above with reference to FIG. 13B.

Notably, the blocks 40 and 42 are symmetric at the process stage ofFIGS. 14 and 14A.

Referring to FIGS. 15 and 15A, the sacrificial material 16 (FIG. 14A) isremoved to leave voids 76 along the first levels 24.

Referring to FIGS. 16 and 16A, conductive material 78 is formed withinthe voids 76 (FIG. 15A) of the first levels 24. The first levels 24 thusbecome conductive levels, and the stack 12 becomes a stack ofalternating conductive levels 24 and insulative levels 26 analogous tothe stack 622 described above with reference to FIG. 6 . The conductivematerial 78 may comprise the same materials described above relative tothe conductive material 628 of FIG. 6 . Accordingly, in some embodimentsthe conductive material 78 may comprise a tungsten core, and a metalnitride liner extending at least partially around such tungsten core.The metal nitride liner may comprise, for example, one or both oftungsten nitride and titanium nitride. Also, in some embodiments adielectric-barrier material may be provided within the voids 76 to linesuch voids prior to provision of the conductive materials 78 within thevoids.

The formation of the voids 76 at the process stage of FIGS. 15 and 15A,followed by the filling of such voids with the conductive material 78,may be considered to be replacement of the sacrificial material 16 (FIG.14A) with the conductive material 78. In some applications, the samereplacement may be conducted across one or more memory arrays proximatethe illustrated crest (intervening) location 15. Such memory arrays mayinclude, for example, memory arrays analogous to the arrays 604 and 606of FIG. 5 . Accordingly, memory cells analogous to the memory cells 638of FIG. 6 may be formed proximate the illustrated crest location 15 ofFIGS. 16 and 16A.

The replacement of the sacrificial material 16 with the conductivematerial 78 may also be conducted within interconnect regions 36 of thetype described above with reference to FIG. 9 . FIG. 16B shows the sameregion as is shown in FIG. 9B, and shows such region at the processingstage of FIGS. 16 and 16A (i.e., after the sacrificial material 16 ofFIG. 9B is replaced with the conductive material 78 utilizing theprocessing of FIGS. 15 and 16 ). The resulting configuration of FIG. 16Bis analogous to that described above with reference to FIG. 8 .

Referring to FIGS. 17 and 17A, the openings 68 and the slits 70, 72 maybe filled with insulative material 80. The insulative material 80 formspanels 82 within the slits 70 and 74. The insulative material 80together with the materials 52 and 64 forms panels 84 within the slits44, 46 and 48. In some embodiments the slits 44, 46 and 48 may beconsidered to be a first series of slits, and the slits 70 and 72 may beconsidered to be a second series of slits which is formed subsequent tothe first series of slits. The panels 80 and 84 may comprise differentcompositions relative to one another. Alternatively, the panels 80 and84 may comprise the same composition as one another if the materials 52,64 and 80 all comprise a same composition (e.g., all comprise, consistessentially of, or consist of silicon dioxide).

In some embodiments, at least one of the materials 52, 64 and 80 may bedifferent relative to another of the materials 52, 64 and 80. Forinstance, one of the materials 52, 64 and 80 may comprise, consistessentially of, or consist of undoped silicon dioxide; and another maycomprise, consist essentially of, or consist of carbon, doped silicondioxide (e.g., carbon-doped silicon dioxide, borophosphosilicate glass,phosphosilicate glass, fluorosilicate glass, boron-doped silicondioxide, etc.) and/or high-k oxide (e.g., aluminum oxide, hafnium oxide,zirconium oxide, etc.).

In some embodiments, the panels 66 (FIGS. 13-13B) may be considered tobe first panels, the panels 82 may be considered to be second panels,and the panels 84 may be considered to be third panels; with the thirdpanels comprising regions of the first panels.

The embodiment of FIGS. 17 and 17A comprises the support structures 56extending through the slabs 20 and 22 of insulative material 28. In theillustrated embodiment, the support structures extend to an uppersurface of the source structure 14 (e.g., may extend toconductively-doped silicon or tungsten silicide associate with thesource structure 14). In other embodiments, the support structures 56may extend to other depths; such as, for example, depths which do notreach the source structure 14, depths which penetrate into the sourcestructure 14, etc.

The intervening region (crest region) 15 of FIGS. 17 and 17A may be inan identical location as the region 645 of FIG. 7 , and accordingly maybe proximate a memory array region analogous to one of the memory arrayregions 604 and 606 of FIG. 5 . Such memory array regions includechannel material pillars 620 which extend through a stack (12 of FIG.17A, 622 of FIG. 6 ; with the stacks 12 and 622 being identical to oneanother in some applications); with such stack including alternatingconductive levels and insulative levels.

The intervening region 15 of FIGS. 17 and 17A may be between the memoryarray region (e.g., 604 of FIG. 5 ) and a staircase region (e.g., 36 ofFIG. 16B, 646 of FIG. 8 ; with the regions 36 and 646 and identical toone another in some embodiments). The staircase region may comprise thestaggered terminal ends 38 of the conductive levels as shown in FIG. 16B(with analogous staggered terminal ends 648 being shown in FIG. 8 ).

The first and second slabs 20 and 22 extend through the stack 12 ofalternating conductive and insulative levels 24 and 26 of FIG. 17A, andare spaced apart from one another by the first bridging region 30. Thesecond and third bridging regions 32 and 34 are on opposing sides of theslabs 20 and 22 relative to the first bridging region 30.

The first series of slits 44, 46 and 48 is along the bridging regions30, 32 and 34, and extends in and out of the plane relative to thecross-section of FIG. 17A. The second series of slits 70 and 72 extendsthrough the slabs 20 and 22, and is parallel to the slits 44, 46 and 48of the first series. The panels 84 may be referred to as first panelswithin the slits 44, 46 and 48 of the first series; and the panels 82may be referred to as second panels within the slits 70 and 72 of thesecond series. In some embodiments, the second panels 82 may becompositionally different from the first panels 84. For instance, thesecond panels 82 may comprise only the single insulative material 80,while the first panels 84 may comprise the material 80 in combinationwith one or more materials (52, 64) which may be compositionallydifferent relative to the material 80.

In some embodiments, the material 80 may be referred to as a firstmaterial, and one of the materials 52, 64 may be referred to as a secondmaterial. In some embodiments, the first material 80 may comprise,consist essentially of, or consist of silicon dioxide, and the secondmaterial (52 or 64) may comprise one or more of doped silicon dioxide(e.g., phosphosilicate glass, borophosphosilicate glass, fluorosilicateglass, carbon-doped silicon dioxide, boron-doped silicon dioxide, etc.),carbon (e.g., amorphous carbon) and high-k dielectric material (e.g.,aluminum oxide, hafnium oxide, zirconium oxide, etc.).

The assemblies and structures discussed above may be utilized withinintegrated circuits (with the term “integrated circuit” meaning anelectronic circuit supported by a semiconductor substrate); and may beincorporated into electronic systems. Such electronic systems may beused in, for example, memory modules, device drivers, power modules,communication modems, processor modules, and application-specificmodules, and may include multilayer, multichip modules. The electronicsystems may be any of a broad range of systems, such as, for example,cameras, wireless devices, displays, chip sets, set top boxes, games,lighting, vehicles, clocks, televisions, cell phones, personalcomputers, automobiles, industrial control systems, aircraft, etc.

Unless specified otherwise, the various materials, substances,compositions, etc. described herein may be formed with any suitablemethodologies, either now known or yet to be developed, including, forexample, atomic layer deposition (ALD), chemical vapor deposition (CVD),physical vapor deposition (PVD), etc.

The terms “dielectric” and “insulative” may be utilized to describematerials having insulative electrical properties. The terms areconsidered synonymous in this disclosure. The utilization of the term“dielectric” in some instances, and the term “insulative” (or“electrically insulative”) in other instances, may be to providelanguage variation within this disclosure to simplify antecedent basiswithin the claims that follow, and is not utilized to indicate anysignificant chemical or electrical differences.

The terms “electrically connected” and “electrically coupled” may bothbe utilized in this disclosure. The terms are considered synonymous. Theutilization of one term in some instances and the other in otherinstances may be to provide language variation within this disclosure tosimplify antecedent basis within the claims that follow.

The particular orientation of the various embodiments in the drawings isfor illustrative purposes only, and the embodiments may be rotatedrelative to the shown orientations in some applications. Thedescriptions provided herein, and the claims that follow, pertain to anystructures that have the described relationships between variousfeatures, regardless of whether the structures are in the particularorientation of the drawings, or are rotated relative to suchorientation.

The cross-sectional views of the accompanying illustrations only showfeatures within the planes of the cross-sections, and do not showmaterials behind the planes of the cross-sections, unless indicatedotherwise, in order to simplify the drawings.

When a structure is referred to above as being “on”, “adjacent” or“against” another structure, it can be directly on the other structureor intervening structures may also be present. In contrast, when astructure is referred to as being “directly on”, “directly adjacent” or“directly against” another structure, there are no interveningstructures present. The terms “directly under”, “directly over”, etc.,do not indicate direct physical contact (unless expressly statedotherwise), but instead indicate upright alignment.

Structures (e.g., layers, materials, etc.) may be referred to as“extending vertically” to indicate that the structures generally extendupwardly from an underlying base (e.g., substrate). Thevertically-extending structures may extend substantially orthogonallyrelative to an upper surface of the base, or not.

Some embodiments include an integrated assembly having a memory arrayregion which includes channel material pillars extending through a stackof alternating conductive levels and insulative levels. A staircaseregion is offset from the memory array region and includes staggeredterminal regions of the conductive levels. An intervening region isbetween the staircase region and the memory array region. Theintervening region includes slabs of insulative material extendingthrough the stack, and includes bridging regions laterally adjacent saidslabs. Two spaced-apart slabs are along a cross-section. Thespaced-apart slabs are a first slab and a second slab. A first bridgingregion is between the first and second slabs, a second bridging regionis on an opposing side of the first slab from the first bridging region,and a third bridging region is on an opposing side of the second slabfrom the first bridging region. A first series of slits extends alongthe bridging regions and into a plane of the cross-section. The firstseries includes a first slit within the first bridging region, a secondslit within the second bridging region and a third slit within the thirdbridging region. A second series of slits extends through the slabs,with the slits of the second series being parallel to the slits of thefirst series. The second series includes a fourth slit within the firstslab and a fifth slit within the second slab. First panels are withinthe slits of the first series. Second panels are within the slits of thesecond series. The second panels are compositionally different from thefirst panels.

Some embodiments include a method of forming an integrated assembly. Aconstruction is formed to include a stack of alternating first andsecond levels. The first levels comprise sacrificial material and thesecond levels comprise first insulative material. A pair of insulativeslabs is formed to extend through a region of the construction. Theinsulative slabs are a first slab and a second slab. A first bridgingregion is between the first and second slabs, a second bridging regionis on an opposing side of the first slab from the first bridging region,and a third bridging region is on an opposing side of the second slabfrom the first bridging region. A first series of slits is formed toextend along the bridging regions, and to extend through the stack. Thefirst series includes a first slit within the first bridging region, asecond slit within the second bridging region and a third slit withinthe third bridging region. First panels are formed within the slits ofthe first series. Openings are formed through the first panels. Theopenings extend through the stack to expose the sacrificial material ofthe first levels. Remaining regions of the first panels are adjacent tothe openings. A second series of slits is formed to extend through theslabs. The second series includes a fourth slit within the first slaband a fifth slit within the second slab. After the openings and thesecond series of slits are formed, the sacrificial material of the firstlevels is removed to form voids. Conductive material is formed withinthe voids. Second insulative material is formed within the openings andwithin the slits of the second series. The second insulative materialforms second panels within the slits of the second series. The secondinsulative material within the openings, together with the remainingregions of the first panels, form third panels within the slits of thefirst series.

Some embodiments include a method of forming an integrated assembly. Aconstruction is formed to include a stack of alternating first andsecond levels. The first levels comprise sacrificial material and thesecond levels comprise first insulative material. The constructionincludes a memory array region and a staircase region offset from thememory array region. The staircase region comprises staggered terminalregions of the first levels. The construction includes an interveningregion between the staircase region and the memory array region. A pairof insulative slabs are formed within the intervening region of theconstruction. The insulative slabs are a first slab and a second slab. Afirst bridging region being is between the first and second slabs, andcomprises a first portion of the stack. A second bridging region is onan opposing side of the first slab from the first bridging region andcomprises a second portion of the stack. A third bridging region is onan opposing side of the second slab from the first bridging region andcomprises a third portion of the stack. First, second and third slitsare formed to extend into the first, second and third portions of thestack, respectively. First openings are formed to extend through theslabs during the forming of the first, second and third slits. The firstopenings and the first, second and third slits are lined with linermaterial. Metal-containing conductive material is formed within thelined first openings and within the lined first, second and third slits.The metal-containing conductive material within the lined first, secondand third slits is replaced with second insulative material. The secondinsulative material and the liner material together form first panelswithin the first, second and third slits. Second openings are formedthrough the first panels. The second openings expose the sacrificialmaterial of the first levels. Remaining regions of the first panels areadjacent to the second openings. A fourth slit is formed within thefirst slab, and a fifth slit is formed within the second slab. Thesacrificial material of the first levels is removed to form voids.Conductive material is formed within the voids. Third insulativematerial is formed within the second openings and within the fourth andfifth slits. The third insulative material forms second panels withinthe fourth and fifth slits. The third insulative material within thesecond openings, together with the remaining regions of the firstpanels, form third panels within the first, second and third slits.

In compliance with the statute, the subject matter disclosed herein hasbeen described in language more or less specific as to structural andmethodical features. It is to be understood, however, that the claimsare not limited to the specific features shown and described, since themeans herein disclosed comprise example embodiments. The claims are thusto be afforded full scope as literally worded, and to be appropriatelyinterpreted in accordance with the doctrine of equivalents.

We claim:
 1. A method of forming an integrated assembly, comprising:forming a construction which includes a stack of alternating first andsecond levels; the first levels comprising sacrificial material and thesecond levels comprising first insulative material; forming a pair ofinsulative slabs to extend through a region of the construction; theinsulative slabs being a first slab and a second slab; a first bridgingregion being between the first and second slabs, a second bridgingregion being on an opposing side of the first slab from the firstbridging region, and a third bridging region being on an opposing sideof the second slab from the first bridging region; forming a firstseries of slits to extend along the bridging regions, and to extendthrough the stack; the first series including a first slit within thefirst bridging region, a second slit within the second bridging regionand a third slit within the third bridging region; forming first panelswithin the slits of the first series; forming openings through the firstpanels; the openings extending through the stack to expose thesacrificial material of the first levels; remaining regions of the firstpanels being adjacent the openings; forming a second series of slitsextending through the slabs; the second series including a fourth slitwithin the first slab and a fifth slit within the second slab; afterforming the openings and the second series of slits, removing thesacrificial material of the first levels to form voids; formingconductive material within the voids; and forming second insulativematerial within the openings and within the slits of the second series;the second insulative material forming second panels within the slits ofthe second series; the second insulative material within the openings,together with the remaining regions of the first panels, forming thirdpanels within the slits of the first series.
 2. The method of claim 1wherein the openings in the first panels are second openings, andcomprising forming first openings to extend through the slabs during theforming of the first series of slits.
 3. The method of claim 2comprising lining the first openings and the slits of the first serieswith liner material, and then filling the lined first openings and thelined slits of the first series with conductive material; and furthercomprising: removing the conductive material from the slits of the firstseries to form trenches within the lined slits of the first series; andfilling the trenches with third insulative material; the thirdinsulative material and the liner material together forming the firstpanels within the slits of the first series.
 4. The method of claim 3wherein the third insulative material and the liner material are a samecomposition as one another.
 5. The method of claim 3 wherein the thirdinsulative material and the liner material are not a same composition asone another.
 6. The method of claim 1 wherein the first panels comprisethe second insulative material.
 7. The method of claim 6 wherein thesecond insulative material comprises silicon dioxide.
 8. The method ofclaim 1 wherein the first panels comprise a composition different fromthe second insulative material.
 9. The method of claim 8 wherein thesecond insulative material comprises silicon dioxide; and wherein thecomposition different from the second insulative material comprisesdoped silicon dioxide.
 10. The method of claim 8 wherein the secondinsulative material comprises silicon dioxide; and wherein thecomposition different from the second insulative material comprisescarbon.
 11. The method of claim 8 wherein the second insulative materialcomprises silicon dioxide; and wherein the composition different fromthe second insulative material comprises high-k dielectric material. 12.The method of claim 1 wherein the sacrificial material comprises siliconnitride.
 13. A method of forming an integrated assembly, comprising:forming a construction which includes a stack of alternating first andsecond levels; the first levels comprising sacrificial material and thesecond levels comprising first insulative material; the constructionincluding a memory array region and a staircase region offset from thememory array region; the staircase region comprising staggered terminalregions of the first levels; the construction including an interveningregion between the staircase region and the memory array region; forminga pair of insulative slabs within the intervening region of theconstruction; the insulative slabs being a first slab and a second slab;a first bridging region being between the first and second slabs andcomprising a first portion of the stack, a second bridging region beingon an opposing side of the first slab from the first bridging region andcomprising a second portion of the stack; a third bridging region beingon an opposing side of the second slab from the first bridging regionand comprising a third portion of the stack; forming first, second andthird slits to extend into the first, second and third portions of thestack, respectively; forming first openings to extend through the slabsduring the forming of the first, second and third slits; lining thefirst openings and the first, second and third slits with linermaterial; forming metal-containing conductive material within the linedfirst openings and within the lined first, second and third slits;replacing the metal-containing conductive material within the linedfirst, second and third slits with second insulative material; thesecond insulative material and the liner material together forming firstpanels within the first, second and third slits; forming second openingsthrough the first panels; the second openings exposing the sacrificialmaterial of the first levels; remaining regions of the first panelsbeing adjacent the second openings; forming a fourth slit within thefirst slab and a fifth slit within the second slab; removing thesacrificial material of the first levels to form voids; formingconductive material within the voids; and forming third insulativematerial within the second openings and within the fourth and fifthslits; the third insulative material forming second panels within thefourth and fifth slits; the third insulative material within the secondopenings, together with the remaining regions of the first panels,forming third panels within the first, second and third slits.
 14. Themethod of claim 13 wherein the metal-containing conductive materialincludes tungsten.
 15. The method of claim 13 wherein the first, secondand third insulative materials comprise a same composition as oneanother.
 16. The method of claim 15 wherein the first, second and thirdinsulative materials comprise silicon dioxide.
 17. The method of claim16 wherein the insulative slabs comprise silicon dioxide.
 18. The methodof claim 13 wherein at least one of the first, second and thirdinsulative materials comprises a different composition relative toanother of the first, second and third insulative materials.
 19. Themethod of claim 13 wherein the liner material comprises a samecomposition as the second insulative material.
 20. The method of claim13 wherein the liner material comprises a different composition relativeto the second insulative material.
 21. The method of claim 13 whereinthe first and second slabs are within first and second block regions,respectively.